Computational modelling of a hot-wire chemical vapour deposition reactor chamber

Abstract

In this thesis, I explore the subjects of fluid dynamics and the Hot-Wire Chemical Vapour Deposition (HWCVD) process. HWCVD, in its simplicity, is one of the more powerful and elegant deposition techniques available in thin film research which allows for both the growth and post deposition treatments of functional thin films. In the HWCVD process, the quality of the final films is determined by a fixed set of deposition parameters namely: temperature, pressure and the gas flow rate. Finding the optimal combination of these parameters is key to obtaining the desired film specifications during every deposition. Conducting multiple trial experiments to determine said parameters can be expensive and time consuming, this is where simulation methods come into play. One such simulation method is Computational Fluid Dynamics (CFD) modelling