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    Hot-wire chemical vapor deposition of silicon nitride thin films 

    Adams, Abdulghaaliq (2013)
    Amorphous silicon nitride (a-SiN:H) thin films has a multitude of applications, stemming from the tunability of the material properties. Plasma enhanced chemical vapour deposition (PECVD) is the industrial workhorse for ...

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    AuthorAdams, Abdulghaaliq (1)SubjectBand Gap (1)Deposition rate (1)
    Growth process (1)
    Hot-wire chemical vapour deposition (HWCVD) (1)Hydrogen content (1)Hydrogenated amorphous silicon nitride (a-SiN:H) (1)Nitrogen content (1)Process parameters (1)Total Flow rate (1)... View MoreDate Issued2013 (1)Has File(s)true (1)

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