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| Band Gap (1) |
| Deposition rate (1) |
| Growth process (1) |
| Hot-wire chemical vapour deposition (HWCVD) (1) |
| Hydrogen content (1) |
| Hydrogenated amorphous silicon nitride (a-SiN:H) (1) |
| Nitrogen content (1) |
| Process parameters (1) |
| Total Flow rate (1) |