Browsing Magister Scientiae - MSc (Physics) by Subject "Hot-wire chemical vapour deposition (HWCVD)"
Now showing items 1-3 of 3
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Aluminium induced crystallization of hydrogenated amorphous silicon thin films
(University of the Western Cape, 2005)This study was carried out to crystallize hydrogenated amorphous silicon (a-Si:H) thin films using the aluminium induced crystallization (AIC) technique. This was done to investigate whether is there any lateral crystallization ... -
Hot-wire chemical vapor deposition of silicon nitride thin films
(2013)Amorphous silicon nitride (a-SiN:H) thin films has a multitude of applications, stemming from the tunability of the material properties. Plasma enhanced chemical vapour deposition (PECVD) is the industrial workhorse for ... -
Optical properties of annealed hydrogenated amorphous silicon nitride (a-SiNx:H) thin films for photovoltaic application
(2013)Technological advancement has created a market for large area electronics such as solar cells and thin film transistors (TFT’s). Such devices now play an important role in modern society. Various types of conducting, ...