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Hot-wire chemical vapor deposition of silicon nitride thin films
(2013)
Amorphous silicon nitride (a-SiN:H) thin films has a multitude of applications, stemming from the tunability of the material properties. Plasma enhanced chemical vapour deposition (PECVD) is the industrial workhorse for ...
Optical properties of annealed hydrogenated amorphous silicon nitride (a-SiNx:H) thin films for photovoltaic application
(2013)
Technological advancement has created a market for large area electronics such as
solar cells and thin film transistors (TFT’s). Such devices now play an important
role in modern society. Various types of conducting, ...